Radiofrequency (RF) power solutions provider Advanced Energy has launched a new power meter designed to deliver accurate in-line RF power measurement for applications requiring precision RF power control in the medical, semiconductor, communication, and industrial markets.
The Gemini 5540A RF power meter combines sensor and meter capability into a single instrument. This integrated instrument enables users to replace multiple instruments with a single meter for applications that require precise measurement and control of RF power.
“In demanding semiconductor processes such as high aspect ratio (HAR) plasma etch, precise control and chamber-to-chamber matching of the RF system directly impact process performance,” says Gerry Blumenstock, vice president, critical sensing and control products at Advanced Energy. “With the new GEMINI 5540A, OEMs can accurately calibrate the system and monitor RF power in real time, improving the fidelity and consistency of leading-edge plasma-based processes.”
Advanced Energy aims to bring new capabilities for improving plasma power controls and performance of advanced etch and deposition processes.
The Gemini 5540A incorporates a OLED digital display that simultaneously shows forward and reverse power, voltage standing wave ratio and frequency. It automatically senses frequency with no reconfiguration required for forward and reverse power measurements.
In addition to taking measurements directly, the meter can also be connected to a PC for collection, storage, and audit of data using Advanced Energy’s Gemini Tools data visualization software.
Featured image: Integrating power sensor and meter into a single instrument, the new RF power meter is designed to simplify monitoring and enables precise control. (Advanced Energy)